Used ASML Twinscan AT 1150i #9112175 for sale

ASML Twinscan AT 1150i is an Integrated Wafer Stepper designed for photomask-to-wafer lithography. It offers powerful optics, low cost of ownership, and a wide range of exposure capabilities for the most challenging lithography processes. The stepper is equipped with an illumination equipment capable of providing fully-programmable exposure fields, allowing for a wide variety of lithographic forms such as long sources, multi-level photomasks and high-resolution masks. The illumination system is based on a DUV-optomechanical unit, correctable for aberrations up to 4th order, providing high numerical aperture (NA) of 0.72 and a minimum spot size as small as 2.5 microns. This high performance optics machine provides excellent resolution and depth of focus, enabling the stepper to cost-effectively address the most advanced process challenges. In addition, the optics tool of Twinscan AT 1150i is capable of supporting an overlay accuracy of 0.3 microns using both standard interferometry and advanced complex pattern recognition techniques. ASML Twinscan AT 1150i is comprised of a variety of critical systems including an auto-aligner, micro projection lens, stepper controller, wafer scanning platform, and wafer stage. The auto-aligner ensures accurate alignment of exposure profiles during the lithography process. The micro projection lens is capable of producing high quality images with a resolution up to 0.6 microns, while the stepper controller manages the exposure resolution and light intensity in a highly optimized manner. The wafer scanning platform supports both single-mask and multi-mask exposure modes, allowing for both high throughput and high repeatability. Finally, the wafer stage is capable of providing accurate positioning and alignment of the wafer with respect to the mask and exposure windows. Twinscan AT 1150i has a powerful software suite, designed to provide an automated and optimized lithography process on a variety of substrates and wafer sizes. The asset includes intuitive user-friendly software controls, which enable operators to carry out process modifications quickly and efficiently. This stepper provides recipe-based predefined recipes for a variety of lithography applications, allowing for quick implementation into the production process. ASML Twinscan AT 1150i also comes with intuitive diagnostics capabilities, which allow operators to quickly identify and address any potential issues in the lithography process. In summation, Twinscan AT 1150i is an advanced, high performance wafer stepper which provides a wide range of advanced lithography options for the most demanding application needs. It features powerful optics, robust software controls, and automated process calibration. The model is an ideal solution for cost-effective and efficient lithography processes.