Used ASML Twinscan AT 1150i #9112177 for sale

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ID: 9112177
Exhaust Handling System.
ASML Twinscan AT 1150i is an extreme ultraviolet (EUV) wafer stepper equipment used in the semiconductor manufacturing industry. Suitable for advanced lithography applications, the system provides high throughput, repeatability, and accuracy. It is capable of a resolution of 32nm and beam sizes up to 40µm. Twinscan AT 1150i has a cube-shaped design with three, individually synchronized, independently moving axes. The X and Y axes allow stepper motion and re-positioning within the field and the Z axis provides focus support. The stepper is equipped with a Laser-Pumped-Alignment (LPA) unit and a built-in non-contact laser for position setting. The stepper features a multi-segment fly-by-shutter scanner that offers a field size as large as 14 mm x 14 mm. The scanner machine operates on a continuous shutter basis, meaning that it can expose an entire field without stopping. This allows accurate exposure and retrieval of data in a single scan. ASML Twinscan AT 1150i scanner tool is integrated with ASML state-of-the-art Photolitho-Rotation® (PLR®) control technology. This technology allows for positioning control with micron-level accuracy and can reduce positioning errors by up to 50%. The stepper's optics are designed to create an EUV beam with a wavelength of 13.5 nm. This beam is optically corrected and directed by a set of distortion-free aspheric condenser lenses. These lenses create an evenly distributed short-circular EUV beam, which ensures precise illumination of the target. In order to achieve higher precision, the stepper features a high-cadence digital-delay generator (DG). The DG can generate pulse lengths ranging from 200fsec to 4e-6sec with down to 1 picosecond of accuracy. Twinscan AT 1150i comes with an automated, self-calibrating feed-simulation asset, which helps maximize effective throughput and accuracy. This model can generate multiple exposures in a single setup and align them in the shortest possible time. The feed-simulation algorithm can also be customized to the individual needs of the user. ASML Twinscan AT 1150i is suitable for a wide range of customized applications. It supports multiple exposure techniques, allowing for a variety of beam configurations. Furthermore, the stepper features a specialized reticle-manipulation equipment that enables the user to quickly and accurately change the reticles. Twinscan AT 1150i is an ideal solution for any advanced photolithography. With its versatility, advanced features, and remarkable precision, the system can provide comprehensive lithographic solutions to clients from both the consumer and industrial fields.
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