Used ASML Twinscan NXT 1970Ci #293817825 for sale
URL successfully copied!
ID: 293817825
Lithography system
Numerical Aperture (NA): 0.85-1.35
DCO: 2
MMO: 3.5
Resolution: 38 nm
Throughput (WPH): 250.
ASML Twinscan NXT 1970Ci is a lithography-based wafer stepper. It uses a DUV (deep ultraviolet) source to expose patterns onto photoresist-covered wafers in a layer-by-layer manner. Twinscan NXT 1970Ci offers several unique advantages over traditional photolithography systems, such as its high vacuum equipment that eliminates the need for an atmosphere exchange unit and its large numerical aperture which supports high resolution imaging. ASML Twinscan NXT 1970Ci employs multiple scanners in parallel, allowing for faster and more efficient throughput. Each scanning unit is connected to a laser-based illumination system that uses wavelength-multiplication principles to achieve optimal resolution and to match resolution requirements for each photolithography layer. An auto in-flight calibration unit continuously monitors the focus and other parameters to assure superior accuracy and repeatability. Twinscan NXT 1970Ci supports a large range of standard photoresist film types and process chemistries, providing greater flexibility in optimizing lithography parameters for each type of wafer layer. In addition, the machine offers advanced alignment control for both global and local alignment, enabling single-exposure stitching on large patterns and die structures without shadowing artifacts. ASML Twinscan NXT 1970Ci is equipped with sophisticated controller systems and advanced 3D monitor toolsets to provide comprehensive control over all lithography and metrology processes. These tools include traceability options, layer-by-layer monitoring for process optimization, and fully automated job set-up, as well as quality control functions such as CD/optical control. Twinscan NXT 1970Ci also offers comprehensive metrology and inspection capabilities, including full 3D non-contact inspection, real-time imaging, film thickness monitoring, and overlay control. In addition, the tool is compatible with a wide variety of wafer handling and packaging systems, allowing for seamless integration into existing factory lines. ASML Twinscan NXT 1970Ci is the perfect solution for high-throughput fab facilities seeking high-performance lithography solutions. It allows for cost-effective, accurate, and repeatable patterning on a variety of photoresists and other film types, making it a reliable and versatile partner in any advanced manufacturing process.
There are no reviews yet