Used ASML Twinscan XT 1250 #9268786 for sale

ASML Twinscan XT 1250
Manufacturer
ASML
Model
Twinscan XT 1250
ID: 9268786
System.
ASML Twinscan XT 1250 is an excimer-wavelength scanner that provides a UV image and assists in the lithography of integrated circuits. It is primarily used in the wafer fabrication process for creating high-volume lithographic masters. ASML TWINSCAN XT:1250 has a resolution of two microns, and it scans up to 1250 wafers per hour. This makes it a suitable and efficient tool for high-end production of wafers. The laser alignment equipment of Twinscan XT 1250 is designed to deliver a precise, high-performance scan. The scanner has a positioning accuracy of 5 microns and an availability of 98%. It has a 6x pattern pre-alignment system and a 5-micron feature pre-align unit, meaning even the smallest features can be accurately positioned. The new three-slide, five-axis design ensures greater accuracy and flexibility. TWINSCAN XT:1250 uses laser illuminator to create a short pulse of UV light which is used for exposure of the sacrificial layer. This pulse of light is then directed to the wafer, and the wafer is exposed while the pattern is aligned. This makes sure the precision of the alignment is maintained and precise results are produced. The Front-end Metrology station is another important feature of ASML Twinscan XT 1250. The Metrology station is used to measure the features on the wafer before exposure. It ensures the wafer is correctly aligned and all features are in the correct positions. ASML TWINSCAN XT:1250 also has an automated Cluster Tool that links the wafer stepper to the cluster tool loader. The tool allows for quick and accurate loading and unloading of wafer patterns. Twinscan XT 1250 also has two independent machine cockpits with real-time display of tool settings, temperatures, high vacuum asset, and other model conditions. This is important for managing equipment components and ensuring the system is always running efficiently. Overall, TWINSCAN XT:1250 is a powerful and accurate wafer stepper capable of producing high-grade lithographic masters in a short amount of time. It has an accuracy of five microns, a high availability rate, and a laser alignment unit that guarantees precision on microscopic levels. Additionally, it is equipped with an automated Cluster Tool and two independent machine cockpits which guarantee correct tool operations.
There are no reviews yet