Used ASML Twinscan XT 1250D #293820026 for sale

ASML Twinscan XT 1250D is a wafer stepper designed for semiconductor wafer fabrication. It is an ultra-high resolution lithography equipment that provides an image size of 890 nm in the X-Y plane. This system uses typical actinic illumination sources, such as laser, to write patterns on the semiconductor wafer, and can produce features as down to 60 nm. It is capable of producing a unique optical pattern in both negative and positive resist. ASML TWINSCAN XT:1250D is equipped with a high performance generator, controller and software for optimal lithography task. It has a 48-inch off-axis mirror and an 8-inch standard field lens unit. The optical machine is based on projection optics and uses catadioptric tool, which ensures image aberration is minimal. The projection optics has an imaging capacity ranging from 175 mm to 5 mm, enabling it to write various kinds of patterns onto the wafer. TWINSCAN XT 1250 D is designed to handle a variety of substrates such as glass, metallic films, and quartz substrates. It has a 12-channel scanner which is used to control wafer movement across the lithography field. This asset is capable of focusing up to 10,000 um per second and can also handle exposure suppression and pattern correction. ASML TWINSCAN XT 1250 D is also equipped with an advanced scatterless scanning model that helps in increasing the exposure time while balancing the ion image characteristics. Its low profile heating equipment provides a uniform temperature to the wafer surface, reducing resist bowing and increasing exposure accuracy. The embedded advanced electrostatic chuck helps maintain a constant pressure on the wafer, enabling fast and precise alignment. In addition, TWINSCAN XT:1250D is equipped with a high performance process chamber, which is able to effectively dissipate gas, liquid and heat in a controlled manner to reduce contamination and maximize uniformity. It also features a narrow bandwidth ion source for improved pattern quality. It's a highly automated system and features a high degree of process control, as well as automated sub-field scheduling, which provides high throughput and repeatability.