Used ASML Twinscan XT 1250D #9393106 for sale

ASML Twinscan XT 1250D is a wafer stepper capable of transferring patterns from a photomask to a variety of wafer substrates. It has been designed to provide fast, reliable high-resolution projection printing for a wide range of microelectronic applications. It is the most advanced lithography tool available from ASML and is suitable for the production of advanced microelectronic products such as memory and logic integrated circuits and 3D-imaging device. The stepper utilizes an advanced vertical scanning equipment, allowing it to perform projection printing with extremely tight requirements on the printed image. It also has a built-in wafer alignment system that allows it to precisely locate the desired reticle area to be scanned and printed. Its resolution is up to 0.50 μm linear and 0.45 μm on-axis, and the tool's throughput is 146-160 wafers per hour. ASML TWINSCAN XT:1250D features a high-resolution laser projection imaging unit, enabling it to produce high-resolution images with accurate wafer-level contouring and uniformity of printed data. It is complemented by an advanced mask aligner with a lithography-level accuracy. The mask aligner is capable of auto-aligning photomasks to the designated wafer pattern with an accuracy of 1.5 μm. TWINSCAN XT 1250 D also supports advanced exposure technologies, such as deep-UV laser imaging, for 350nm and 450nm exposure. Furthermore, it has an advanced on-board firmware machine that allows rapid setup and easy programming for a wide range of applications. This tool is suitable for applications such as high-performance memory devices, organic light-emitting diode displays, and image sensors with very small pitch features. It can also handle advanced applications such as precision metrology, photomask repair, and high-resolution 3D imaging. In conclusion, ASML TWINSCAN XT 1250 D is an advanced wafer stepper with superior imaging and throughput capabilities. It offers the ultimate precision printing for a variety of high-end microelectronic applications, and its high-resolution laser projection imaging tool provides exceptionally accurate and uniform patterning.