Used ASML Twinscan XT 1400F #9143647 for sale
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ID: 9143647
Wafer Size: 12"
I-line wafer stepper, 12"
ArF Exposure tool
Exposure wafer: LP*1/WS*1/Chuck*2/WH*1/RS*1/RH*1/Laser*1
193nm scanner
Photo module
Equipment type: PS-ARF
Missing parts:
Spare assy, auto shutter
Spare assy, beam reverser
Power supply assembly, DC
Power supply, switching, 480V, 3 Phase in, 24V@125A
Spare, LAM 54,471, module assy, 193nm w/EIS, w/LF, AWR
(ARF,SAM)Spare, sam module, 193nm,w/EIS, SAM
Spare,line narrowing module,LNM ,45x
WS Type1,2,3 ss1 XY motor assy
Blower motor assy
ACC MK4 Clean air fan
SPM RS Encoder head top mnt Y1
(2) Spares, blower motor controllers, XL, 56-turn
Assy, resonant charger, XLA-100, 7 joule
(2) Commutators
OC ( ArF)
Spare.assy. ArF 45w laser. long life PA chamber
Spare.assy. ArF 45w laser. long life MO chamber
WH SHB II Assy
MPCR (meas.pos.control rack)
Assy, CAN controller module, lower left optics
Power amp controller PPCA
WS Type 3+4 OXB coupl frame&clamps (XT1400)
WS Type 3+4 open X-beam assy
Spare assembly, MO web
Spare assembly, PA web
Spare, mechanical assy, ISS
DOE 193P ID18 MP2 40-Y FO
Aerial-P XT: 14X0 FO
DOE 193P ID8 MP2 90-X FO
DOE 193P ID7 MP2 90-Y FO
DOE 193P ID5 MP4 30-45 FO
Recipe creator light FO
Exposure FO
Integrated reticle library FO
AUX Port, 12" FOUP/(25) wafers FO
IRIS for Twinscan, 6" FO
Reticle CIDRW hermos (RF) FO
24-Character barcode reader Twinscan
Second laser paddle cymer
ESI EX2600 Hybrid
2005 vintage.
ASML Twinscan XT-1400F is a world-leading wafer stepper used to pattern tiny features on photomasks for use in the manufacturing of integrated circuits. The Twinscan is based on a uniquely designed stepping and scanning motion that uses a patented 1-to-1 ratio, ensuring a fast, uniform movement of the wafer stage. Twinscan XT-1400F also boasts a larger area field size than competing steppers, allowing more features to be printed on a single substrate in a single exposure. ASML Twinscan XT-1400F integrates High Resolution Scan Artem technology, enabling superior throughput and fewer false edges. The vibration-free design enables the highest accuracy positioning, allowing for features as small as 5 nanometers to be printed. The Twinscan supports a range of substrates including silicon, quartz, Mylar, and various multilayer substrates. Twinscan XT-1400F also features a high stability multi-gas chamber with a hot escapement of reactive gases, providing optimum processing times and uniform final microstructures. Moreover, the Optics & Polarizer System allows the system to achieve precise polarization control, high throughput, and superior imaging quality, while the Low Mass Wafer Stage eliminates image blurring from vibration. ASML Twinscan XT-1400F supports a wide range of exposure parameters and is capable of consistently producing high-resolution images at extremely fast speeds. Furthermore, the Digital MicroScanner software allows for ease of operation and precise functionality of the system. Lastly, the reverse scan architecture of Twinscan XT-1400F results in low level of particle contamination on the photomask and substrate. Overall, ASML Twinscan XT-1400F is a state-of-the-art wafer stepper that offers a unique combination of superior picture resolution, excellent throughput, power efficiency, and minimal particle contamination. It is ideal for creating microscopic features on integrated circuits, and its array of feature-rich technologies makes it well suited for a range of substrates.
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