Used ASML TWINSCAN XT 1700FI #293603594 for sale

ASML TWINSCAN XT 1700FI is a photolithography equipment used in the fabrication of integrated circuits. The system is used for exposing patterns on a semiconductor wafer. It employs a 193 nanometer KrF laser light source to expose the patterns on the wafer and the semiconductors. The unit is based on a wafer stepper platform, which is composed of an exposure chamber, an exposure head and a track. The exposure head comprises a laser illuminator, projection optics, and a scanner. The laser illuminator emits a narrow beam of light that is focused with the projection optics on to the wafer. The scanner then moves the wafer horizontally across the laser beam and the pattern is exposed onto the wafer. ASML TWINSCAN XT:1700FI is one of the highest performing scanners available in the industry, capable of delivering exposure speeds up to 340 mm/s. It offers nanometer level accuracy, with resolution of 0.06micron and enhanced uniformity over the exposure field. The exposure head features 16 Magnification options and a programmable aperture machine that enables customers to achieve higher throughputs and more uniform films than previously possible. Its advanced cooling, small footprint and adjustable static electric field all further contribute to the exceptional exposure performance of the tool. In addition to the scanner, TWINSCAN XT 1700FI provides various other features that improve user experience and reduce cost of ownership. Its integrated wafer handling asset allows for automated wafer handling, thereby reducing operator labor. Its built-in load/unload model eliminates the need for a separate loading station, eliminating cost and space requirements. Several maintenance options can be programmed into the equipment for regular maintenance, reducing downtime and operational costs. The system is suitable for any type of device, from digital to analog circuits, and from SRAM to DRAM devices. It is also robust enough to handle different wafer materials. Additionally, it is compatible with the latest version of ASML proprietary Euv lithography ASML software, which ensures the best possible results. TWINSCAN XT:1700FI is a remarkably versatile and reliable photolithography unit that allows users to produce high-quality products in a cost-efficient fashion. Its high throughput and accuracy can benefit any fabrication process, making it an ideal choice for any semiconductor fabrication facility.