Used ASML Twinscan XT 1700i #293812028 for sale

ASML Twinscan XT 1700i wafer stepper is an advanced, high-resolution lithography machine used to create precise patterns on semiconductor wafers. This equipment utilizes a wide variety of imaging and illumination techniques to process substrates with various materials and layers. The advanced Twinscan XT 1700i is equipped with the proprietary Plasma Source Immersion Lithography (PSIL), a highly efficient and cost-effective process for creating patterns on larger substrates. PSIL enables accurate imaging of fine features while maintaining a high throughput rate. It also utilizes a Lighthouse Optics System that provides uniform illumination over a large area, allowing for more accurate and precise imaging. ASML Twinscan XT 1700i is equipped with an industry-leading Z-scanner that is capable of moving the large substrate in the x, y, and z-axes allowing it to scan in three dimensions. This improved accuracy ensures that the entire substrate is captured and any resulting defects are minimized. Additionally, the Wafer Media Handler within the unit can simultaneously process up to seven 6-inch and eight 8-inch (200 mm) wafers. Twinscan XT 1700i is able to acquire data quickly and accurately with an exceptional feature resolution reaching sizes of down to 25 nm. It also boasts a wide range of exposures achieved through a combination of illumination types, such as KrF, ArF, high numerical aperture off-axis illumination, and PSIL exposure that results in significant levels of clarity and detail. Finally, ASML Twinscan XT 1700i is energy-efficient thanks to its proprietary Nano-Tempo Power Conservation Technology, which ensures that the machine utilizes just the right amount of power in order to minimize power consumption and further enhance its speed, which can exceed speeds up to 30 wafers per hour. The combination of its accurate imaging, energy-efficiency, and precise feature resolution make Twinscan XT 1700i an ideal tool for high-speed semiconductor wafer fabrication.