Used ASML Twinscan XT 1700i #293817830 for sale
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ID: 293817830
Argon Fluoride (ArF) Scanner
Numerical Aperture (NA): 1.2
Resolution: 65 nm.
ASML Twinscan XT 1700i is an advanced immersion lithography equipment designed for the semiconductor industry. This wafer stepper is a key component in the semiconductor manufacturing process, enabling the precise patterning of integrated circuits on silicon wafers. The XT 1700i is part of ASML Twinscan platform, renowned for its leading-edge technology and superior performance in semiconductor lithography. At the heart of the XT 1700i is its immersion technology, which enhances the resolution and accuracy of the lithography process by using a liquid medium between the projection lens and the wafer. This immersion technology allows for smaller features to be patterned on the wafer, pushing the boundaries of semiconductor manufacturing towards smaller nodes and higher density integrated circuits. The XT 1700i features a large field of view, enabling the exposure of multiple dies on a single wafer simultaneously. This high throughput is essential for maximizing the productivity of semiconductor fabs and reducing manufacturing costs per chip. The system is also equipped with a high numerical aperture (NA) projection lens, which contributes to its superior resolution and imaging performance. In order to achieve optimal imaging and patterning results, the XT 1700i employs a sophisticated alignment and leveling unit. This machine ensures that the wafer is precisely positioned and oriented within the exposure field, minimizing overlay errors and improving pattern fidelity across the entire wafer. The XT 1700i is compatible with a wide range of photoresist materials, enabling semiconductor manufacturers to adapt to different process requirements and achieve the desired patterning results. The tool also features advanced control software that provides real-time monitoring and adjustments to ensure consistent and accurate patterning across multiple wafers. One of the key advantages of the XT 1700i is its flexibility and scalability. The asset can be easily upgraded with new modules and features to incorporate the latest technological advancements in immersion lithography. This scalability allows semiconductor manufacturers to stay competitive in a rapidly evolving industry and meet the demands of next-generation semiconductor devices. Overall, Twinscan XT 1700i is a state-of-the-art wafer stepper that offers unmatched performance, resolution, and productivity for semiconductor manufacturing. With its immersion technology, advanced alignment and leveling systems, and high-throughput capabilities, the XT 1700i is a key tool for enabling the development of cutting-edge semiconductor devices and pushing the boundaries of semiconductor technology.
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