Used ASML XT 1250B #9383217 for sale

ASML XT 1250B is a wafer stepper designed for lithography in the semiconductor industry. It provides effective pattern transfer onto semiconductor wafers, with improved device performance and enhanced productivity. This wafer stepper uses a variety of lens technologies to accurately focus the imaging beam onto the wafer surface, allowing for precise placement and replication of patterns. ASML XT:1250B platform can utilize advanced lens technologies such as EUV/DUV and multiple exposure fields. This is a dual-stage wafer stepper that uses a patented dual-level vacuum system to accommodate different substrate sizes for flexible device production. It is built with a modular design, allowing it to be quickly configured and reconfigured for high-volume production. Additionally, XT 1250B utilizes a sub-micron high-resolution projection optics system, enabling it to produce patterns with line widths in the range of 0.2-1.2 µm. This wafer stepper is equipped with a vacuum/differential loading system and camera autofocus which combines the imaging objective lens and camera lens in a unique configuration for high-precision alignment. It is designed to reduce particle generation and improve the balance of contamination-free imaging between stages. XT:1250B also features a low-noise stepper controller and motor driver, providing reliable in-clocking for precise substrates positioning. ASML XT 1250B is also capable of executing intensive pattern overlay alignment, utilizing image processing software for image comparison and measurement control. This machine is designed to reduce placement discrepancies by using advanced image analysis. In summary, ASML XT:1250B is a powerful wafer stepper designed for lithography. Its dual-stage design, advanced imaging optics technology, and optimized sensor systems allow it to produce precise patterns with minimal contamination and improved detection precision. The highly efficient processing of this machine is ideal for both high-volume production and precise device fabrication.