Used ASML XT 1250D #293623548 for sale

Manufacturer
ASML
Model
XT 1250D
ID: 293623548
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ASML XT 1250D is a full field step-and-scan equipment that is used for high-volume lithography of semiconductor wafers. It is based on the XT 1200 series architecture and offers a range of applications to suit the lithography needs of various customers. The machine is capable of producing high-density patterns with advanced overlay and over-exposure control. It is designed to deliver high throughput, low cost of ownership and excellent throughput performance. XT 1250D has a state-of-the-art optics system with a high numerical aperture, providing superior resolution and image quality. It accommodates three types of photoresists for single, double and triple exposures. It also features an advanced wafer handling unit that has built-in safety and fault-tolerance functions. The stepper is designed to maintain high mechanical integrity and stability, and it is equipped with user-friendly diagnostics and control systems. The machine also features an advanced stage and imaging control machine that enables high throughput, stable patterning and fast field-of-view switching. The lithography optics provide improved performance due to advanced laser alignment and maintenance features. The tool is highly automated and can perform single to multi-field exposures with ease. The stage trajectory control is based on high accuracy scanning servo and laser alignment, enabling fast and accurate alignment. The embedded software and architecture of ASML XT 1250D is programmed to ensure high performance, reproducibility and uniformity. It provides reliable data management and easy access to process parameters for time-saving reproducibility. External hardware can also be integrated for improved environmental and thermal stability. The machine also offers scalable output power for optimal dose control. Overall, XT 1250D is a powerful, high-precision step-and-scan asset that can handle a range of photolithographic processes with fine optical control. Its advanced optics can handle wide exposure ranges and the embedded software provides user-friendly operation, fast throughput, and reliable patterning.
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