Used ASML XT 1250D #293624486 for sale

ASML XT 1250D is a wafer stepper designed for semiconductor device manufacturing. It is a 4-track equipment capable of ultra-fine feature processing. The system uses a LaserRay Reflex 3 laser source, capable of providing exposure from 250 nm to 1700 nm, and an integrated high-sensitivity imaging head with 405 nm wavelength. The unit's 200 mm x 300 mm matrix can process a high-resolution image with a pixel size of as low as 0.2 micrometers, allowing for sub-micron patterning of advanced semiconductor components. The machine also includes advanced design features such as intelligent overlap control, pattern matching, and field matching, to ensure accurate placement of the imaging head over the semiconductor wafer. Additionally, a beam track and focus control tool allows accurate placement and focalization of the imaging beam, which is critical for proper printing of the finest geometries. XT 1250D utilizes a state-of-the-art thermal imager for enhanced contrast resolution, with a maximum operating temperature of up to 370°C. Additionally, the asset features various safety features including a micro-dose, high-beam-current monitor, real-time fault monitoring, and a 5-level safety interlock model. Moreover, the equipment features a high-precision stage with levels of repeatability and reproducibility. An optical alignment microscope is used for positioning accuracy and verification, helping to ensure that the wafer is square and centered on the stage. Furthermore, the system can be configured with up to 3 automation robots, allowing for faster process throughput and better utilization of machine resources. Finally, with an ever-increasing need for accurate stepper performance and reliability, ASML XT 1250D meets these demands through its proprietary communications link, which has been optimized to provide real-time unit monitoring. The machine can also be integrated with an internal networks, allowing for data analysis and remote process monitoring. Overall, XT 1250D provides a highly productive, high-precision environment for microfabrication and semiconductor device production.