Used ASML XT 1250D #9192070 for sale

ASML XT 1250D is a top-of-the-line wafer stepper used for photolithography in the semiconductor industry. XT 1250D is a laser-based imaging system that is capable of producing circuits with extremely high level of detail and uniformity. The laser used in ASML XT 1250D is a high-power argon-fluoride (ArF) Excimer Laser, which has a maximum power rating of 200 watts. This allows the machine to produce a clear and consistent image at a resolution of less than 3 nanometers. Thanks to the argon-fluoride laser, XT 1250D can also support a large variety of mask materials and resists, both organic and inorganic. ASML XT 1250D is equipped with an X-Y stage and up to four deflector optics that enable this wafer stepper to precisely position and expose the target wafer. Thanks to these optics, the exposure field size can be up to a maximum of 21 inches. The machine also supports automated alignment with five separate and distinct cameras to ensure accurate alignment of the wafer on the X-Y stage. XT 1250D is a reliable and cost-effective imaging system, but what makes it truly stand out is the quality of its imaging. The ArF laser has a focused beam spot diameter (83λ) that allows the wafer stepper to achieve a critical dimension (CD) accuracy of the best 5nm. Also, ASML XT 1250D is very efficient with an impressive throughput of up to 2,800 wafers per hour, and with a cycle time of less than 6 seconds for a single wafer. XT 1250D is designed to be user-friendly, and it is compatible with industry-standard supervisory control and data acquisition (SCADA) systems. This makes it easy to integrate the machine into a production line or any other type of photolithography process. In conclusion, ASML XT 1250D is a top-of-the-line wafer stepper that offers excellent imaging accuracy, reliability, and an impressive throughput coupled with a very affordable price tag. For these reasons, it is one of the best choices for producing circuits with extreme accuracy and detail.