Used ASML XT 1250D #9293668 for sale

ASML XT 1250D
Manufacturer
ASML
Model
XT 1250D
ID: 9293668
Wafer Size: 12"
Vintage: 2004
ArF Scanner, 12" 2004 vintage.
ASML XT 1250D is a high-end wafer stepper designed to etch shape impressions on a wafer. It is able to produce a wide variety of lithography patterns using extreme UV radiation (EUV). XT 1250D has a number of features that make it a highly sought-after machine. ASML XT 1250D has a Lithographic Application Mask Program (LAMP) that allows advanced control over the lithography process. This equipment allows for accuracy on the order of 0.5 nanometers and allows for intricate details to be etched onto a wafer or other substrate. This makes XT 1250D useful for a variety of high-precision applications, such as microelectronics, semiconductor production, and optical data storage. ASML XT 1250D has an exposure chamber, a chamber full of xenon lamps that create the EUV radiation necessary to etch patterns into a wafer. The chamber is divided into three zones, allowing for a wide range of radiation levels and exposure times. This allows for flexibility in the pattern that can be created and allows for intricate shape etching in a single operation. XT 1250D also has an advanced metrology system. This unit is able to measure critical dimensions on wafers and other substrates, ensuring that patterns are etched correctly and with the highest possible accuracy. This ensures that the patterns created by ASML XT 1250D will be sharply defined and accurate. XT 1250D also has a number of safety and environmental features. It has an active radiation monitoring machine and sophisticated shielding to protect operators and laboratory staff from hazardous radiation levels. Additionally, ASML XT 1250D has an automatic clean-out tool that ensures that no hazardous materials are left behind in the chambers after the lithography process is complete. In conclusion, XT 1250D is a highly advanced wafer stepper. It combines the latest technology and features to provide operators with a highly accurate and precise lithography solution. Its advanced metrology asset, multiple radiation exposure zones, and radiation monitoring systems make ASML XT 1250D a great choice for any application requiring precise pattern etching.
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