Used ASML XT 1400E #9289671 for sale

ASML XT 1400E
Manufacturer
ASML
Model
XT 1400E
ID: 9289671
Wafer Size: 12"
Vintage: 2006
Lithography system, 12" SMIF / FOUP ARF Scanner Projection lens: RMS Z5-Z37 : 2.65 nm RMS spherical: 0.76 nm RMS coma: 1.92 nm RMS astigmatism: 0.45 nm RMS 3-foil: 0.71 nm Straylight at ref. blocksize: 0.75% Illumination: Integrated slit uniformity setting: 0.9% Illumination intensity setting: 1575 mW/cm2 Dose repeatibility Dose accuracy setting Pupil verification Ellipticity setting: 0.321 mean Missing parts: BMU Y1 Shuttle hook motor hose connect parts (2) PSU Workstation R-chuck PMB 5 MPD Box SHB E-Rack SHB Component box WH Robot PPD DIFF Sensor (2) CCM Zero laser box MCCB (2) PAAC CPM Board load 2006 vintage.
ASML XT 1400E is a state-of-the-art wafer stepper used in the semiconductor industry for lithographic patterning of integrated circuits. XT 1400E employs advanced technologies such as a six-axis non-SA constant scan (NASC) stages for improved accuracy and speed. This machine has a numerical aperture of 0.55 and a field size of up to 200mm. It is capable of exposure time as short as 10 milliseconds and can perform repeatability within 5nm. ASML XT 1400E is specifically designed to image and exposure resist on a wafer to create fine line circuits and features such as interconnects and trenches. It is also capable of automatic alignment of multiple exposure dies and overlay of more than 90 layers of patterns from designs. This reduces the need for complex lithographic exposure recipes. XT 1400E uses an advanced illumination equipment to reduce the surface roughness of the exposure results. This is made possible via the use of a high pulse laser, and a 'Super High NA' (SHNA) off-axis illumination system. This provides dynamic control over exposure intensity and enables dynamic alignment for both imaging and exposure accuracy. ASML XT 1400E has several built in safety features as well. Its internal laser interlock at exposure locations reduces the risk of laser exposure and a collision detection unit checks for unexpected movement of exposure elements. In addition, XT 1400E features a built-in environmental control machine to maintain optimum working temperatures, humidity, and air quality during operation. In conclusion, ASML XT 1400E is an advanced and highly sophisticated wafer stepper with the capability to image and exposure resist on a wafer to create fine line circuits, features, and interconnects. Its built-in safety features, advanced illumination tool, and environmental control asset ensure seamless and accurate operation time and time again.
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