Used ASML XT 1400E #9289672 for sale

ASML XT 1400E
Manufacturer
ASML
Model
XT 1400E
ID: 9289672
Wafer Size: 12"
Vintage: 2005
Lithography system, 12" SMIF / FOUP ARF Scanner Projection lens: RMS Z5-Z37 : 3.16 nm RMS Spherical: 1.62 nm RMS Coma: 1.69 nm RMS Astigmatism: 0.48 nm RMS 3-Foil: 0.46 nm Straylight at ref blocksize: 0.62% Illumination: Integrated slit uniformity setting: 0.44% Illumination intensity setting: 1748 mW/cm2 Dose repeatibility: 0.199 Dose accuracy setting: 2.896 Pupil verification Ellipticity setting: 1.879 mean Focus and leveling: Leveling verification: Chuck to chuck focus difference: 5 nm 2005 vintage.
ASML XT 1400E is a top-of-the-line wafer stepper made by ASML, a leader in the semiconductor lithography field. XT 1400E is a state-of-the-art machine that provides precise micro-lithography for microelectronics fabrication. The machine features a number of advanced features that make it ideal for high-precision fabrication tasks, such as exposing photo-resist to create conductive layers on wafers, circuit patterns, and other components. ASML XT 1400E is designed to perform as a single-step optical lithography system, utilizing a combination of light source, lenses, beam splitters, and a blanking shutter to create a pattern from a photomask or reticle onto a wafer or test substrate. The machine is equipped with a range of light sources, including KrF and ArF excimer lasers, which can be used to create sub-micron resolution images. The stepper can also be used in conjunction with an optical coherence tomography system, allowing the user to optically inspect features that are too small for a microscope. XT 1400E is also equipped with a Sensitive Precision Beam Alignment and Adjustment Tool (SPAT), allowing the machine to accurately focus and move the stepper head across the wafer. The SPAT uses laser interferometry and feedback systems to provide the exact position of the exposed feature, as well as other parameters such as line width. This enables the machine to produce features with tolerances of under 1nm. ASML XT 1400E is also equipped with computer automated operation (CAM) capabilities, allowing users to save and run operation parameters from a database. The machine is also compatible with a range of photomasks, such as quartz, polycarbonate, and metal masks. Additionally, users can select from a variety of image formats including the Pro-Lithogen suite, enabling users to process a wide variety of tasks. XT 1400E is designed to be fast and efficient, with an exposure time of up to 20 seconds. The machine is designed with flexibility in mind and is compatible with a range of pre-defined masks, optical systems, and stepper heads, making it suitable for a range of applications. In conclusion, ASML XT 1400E is a top-of-the-line wafer stepper that provides precise and efficient micro-lithography for microelectronics fabrication. It is a cutting-edge machine that offers a range of features, including sub-micron resolutions, automated operation, and a range of masks and image formats.
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