Used ASML XT 1400E #9381463 for sale

ASML XT 1400E is a high performance wafer stepper specifically designed for fast, high-volume wafer production. The equipment features a production mask level of 0.7, with a focus accuracy of +/- 0.8 microns for the most precise wafer production possible. The system is designed to maximize production throughput, with an optional dual-field scanner, allowing users to increase the number of separate fields which can be exposed at once. The unit is based around two major optical elements; a beam delivery machine for the beam emitted from the source and an excimer laser for exposure. The beam delivery tool utilizes an f-Theta telescopic asset, ensuring the highest level of accuracy with minimal aberrations. This minimizes wafer distortion and ensures high throughput rates with minimal reticle movement. The exposure subsystem contains a 1200W excimer laser, providing industry leading power levels for faster wafer imaging. The model is operated via computer with a user-friendly operator interface. While the laser is programmable, it is also capable of being manually adjusted should manufacturers require a custom exposure. XT 1400E is designed for maximum production yield. The equipment can monitor and adjust laser power in real time, automatically adjusting exposure times for the most efficient wafer production. It also features an integrated load lock for wafer handling, minimizing the potential for contamination. The system also includes an automatic column handling unit to ensure highest accuracy during production. In addition to standard production capabilities, ASML XT 1400E includes additional features designed to reduce downtime. The machine includes an automation reporting tool which allows the operator to monitor performance and quickly detect any potential issues. Additionally, an integrated diagnostic asset allows the technician to quickly provide maintenance and check up operations. XT 1400E is an extremely precise and powerful wafer stepper, capable of providing industry-leading performance with minimal downtime and maximum output. With a production mask level of 0.7 and a focus accuracy of 0.8 microns, it is perfectly suited for high-volume production lines.