Used ASML XT 1400F #9237068 for sale
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ID: 9237068
Wafer Size: 12"
Vintage: 2006
Immersion lithography system, 12"
2006 vintage.
ASML XT 1400F is a high resolution, large field maskless lithography equipment designed for production of advanced semiconductor dies. It consists of a bright, built-in light source, an optimized projection optics, and a precision nanoscale stage for substrate manipulation. XT 1400F incorporates an ultraviolet (UV) light source, with the ability to produce high power lines and arcs with a wavelength of 193nm. This ultra-precise light stream is projected through a spatial filter and optical components of the projection Optics onto the wafer stage. The number of photons and the uniformity of the illumination can be precisely tuned for individual applications. The projection optics are designed to provide unmatched resolution and uniformity of the exposure field over 12000 mm2. It carries multiplexing configurations, different sizes of lenses, laser alignment and focus adjustment capabilities, as well as an integrated contamination-reduction system to provide a clean environment. The nanoscale stage is specially designed to handle wafers up to 300mm in size. It provides a range of motion of 200nm in X and Y direction and a Z motion range of 20nm, along with a scan speed of up to 5000mm/sec. The robotic wafer transfer unit of ASML XT 1400F can handle multiple wafers at one time and allows precise placement of wafers onto the stage without collecting contaminants from the environment. The advanced control and metrology functions of XT 1400F ensure absolute accuracy and repeatability in production. The machine incorporates an on-board suite of process control tools for stable and reliable operation. Moreover, its advanced feedback-based algorithms allow for rapid adaptation of the exposure process to changing environment, improving process control and maximising yield. ASML XT 1400F is an efficient, reliable and robust tool for maskless lithography, delivering wafer stepper performance with high throughput, excellent overlay accuracy with no alignment marks on the wafer, and unmatched resolution.
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