Used ASML XT 1700FI #9269682 for sale
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ID: 9269682
Stepper, 12"
SMIF
Automation online component: SECE I / II
Reticle size: 6"
Inline flow: Left
WH Port number: FOUP left type
RH Library: MK V type
PPD Type: PPD2
Lens and illumination:
Max NA: Other
BMU Type: Standard
Light source:
CYMER XLA-360 Laser
Stage:
SCAN Speed: 320 mm / sec
Chuck: Pin chuck
2007 vintage.
ASML XT 1700FI is a 5th generation full field Immersion (FFI) wafer stepper used in semiconductor industry to produce Integrated Circuits (ICs). This machine is equipped with a highly advanced auto-collimator to provide superior lithography performance and accuracy of ≤ 0.2 μm at a field size of ½ inch . ASML XT1700FI features a 'krypton fluoride' immersion optical imaging equipment that provides an extremely high numerical aperture (NA) of up to 1.38, and provides the capability to pattern feature sizes from 8 nm to 20 nm. The FFI system makes use of an afocal medium for the new 4D imaging process, which accelerates throughput thus improving productivity; and features a comprehensive wafer tracking and analysis unit for analyzing wafer post-image processing. The machine's integrated scanning technology is able to reduce variation and focus on imaging targets for increased accuracy, uniformity and defect inspection capability. XT:1700FI features a field depth of focus (FDOF) of over 70 μm, allowing for more precise resolution and clarity of the image throughout the entire image. The machine also employs a fast, low noise "Ozone Clean" machine to reduce photomask contamination, reducing mask contamination by 75%, and is equipped with a new thermal modeling tool to optimize air conditioning to prevent temperature related process non-uniformities. ASML XT:1700FI wafer stepper also features ASML advanced metrology capabilities, which allow for accurate measurement of exposure performance, defect control, dose control, and focus control. Additionally, the machine has an advanced automated mask loading systems, which reduce the time required to load the 2700mm photomask, and a variety of options for recipes, filters, monitoring and photoresist materials choices. XT 1700 FI is an ideal tool for advanced lithography processes and precision imaging. It provides superior throughput, stability, accuracy and repeatability, allowing IC manufacturers to achieve tighter tolerances and improved yields with faster turnaround times.
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