Used ASML XT 1700Gi #9299038 for sale
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ID: 9299038
Wafer Size: 12"
Vintage: 2006
Immersion lithography system, 12"
CIM: Secs / GEM
Process: Immersion lithography
(2) SMIF Factory interfaces
FOUP Loader handler system
CYMER XLA360 System
TEL Lithius interface
24 Character BC Reader
Water cooling for EL cabinet
Contrast controller
Universal prealignment
Dosemapper
2006 vintage.
ASML XT 1700Gi is a high-end wafer stepper, designed for accurate intra wafer patterning. It features a twin lens projection column and a tailored illumination works module, delivering a numerical aperture (NA) of 0.75 and a field size of up to 1250 x 1750mm. It is designed to be used with exposures ranging from 6 to 220mm thick, giving it a wide range processing range. The stepper's imaging system uses advanced projection lithography, projecting a pattern image down onto a substrate. It also has an energy range of 6-23mJ/cm2, making it suitable for most new patterning materials. In addition, it is equipped with a 3D semi-isotropic, polarisation correction plate, allowing it to deliver accuracy and repeatability at ultra-violet (UV) exposures. The machine is controlled by a user-friendly, highly intuitive graphical user interface (GUI). The GUI is capable of controlling complex sequences of operations, and integrates with other modules for pattern generation, as well as tracking diagnostics. It is also equipped with a high-speed pattern recognition option, giving it the ability to trace and correct any errors that may occur. The stepper also boasts a high-output wafer stage, capable of reaching speeds of up to 200mm/s. The stepper is also available in different configurations, allowing it to be customized according to size and application needs. It is equipped with an environmental control system, which monitors and maintains the air cleanliness inside the stepper. This monitoring capabilities enable it to keep contamination levels low, enabling the machine to run safely and effectively. XT 1700Gi is an advanced wafer stepper, capable of producing accurate intra wafer patterns with a wide exposure range. Its versatile illumination module and 3D semi-isotropic polarisation correction plate ensure accuracy and repeatability. The adjustable speed, combined with the user-friendly GUI and environmental control system make the machine a reliable and efficient choice for any wafer patterning task.
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