Used ASML XT 1950Hi #293802187 for sale

Manufacturer
ASML
Model
XT 1950Hi
ID: 293802187
Wafer Size: 12"
Lithography system, 12" Load ports laser Hard Disk Drive (HDD) Immersion lithography: 193 nm Resolution capability: 38 nm Overlay: SMO: 4 nm MMO: 7 nm Throughput: 148 WPH CYMER XLR-560i Resolution: 193 nm Laser: 60 W / 6 kHz with E95 Bandwidth monitoring Controls: UNIX / SUN Architecture Aerial XP Illumination system P type: Illumination alignment Alignment: Blue align with narrow mark Focus and Field-by-field levelling Focus spot monitoring Circuit Dependent Focus Edge Clearance (CD-FEC) Dual E-Chucks LS-MATCH2 (XT) Image streaming Overhead reduction: 1 and 2 Productivity Enhancement Package (PEP) In-situ metrology: Sensor module UNICOM XT: Dose mapper ArF (15) QUASAR XL Slots Reticle shape correction 2DE Grid calibration Twinscan overlay package Water cooling for electronics cabinet Integrated Reticle Library (IRL-XP) for H-SPEC Systems Integrated Reticle Inspection System (IRIS-XT) Reticle streaming: Spotless G and H Twinscan Grid mapper TEAL PCDU-XT1900 Distribution unit FSM flex package Aux port 300 mm FOUP / 25 Wafers Reticle with defect: 40 nm SMASH XY ZEISS Starlight: 1950 XCDA Gas purification system: Purifier canister: Optics series, 10 MH, SS XCDA Gas purification system bypass manifold: Manifold 3 Valve: 10 m Filter housing Cabinet ESI Vaporsorb: EX2600 Filter set Throughput: 148 WPH CE Marked Laser power: 60 W Power conditioner: 135 kVA.
ASML XT 1950Hi is a cutting-edge wafer stepper designed for high-volume semiconductor manufacturing. Built by ASML, a leading provider of photolithography equipment, this equipment represents the latest advances in patterning technology, offering extreme precision and versatility for the production of advanced semiconductor devices. At the heart of ASML XT1950HI is its advanced platform, which combines innovative hardware and software solutions to enable sub-nanometer accuracy in critical dimension control. This level of precision is essential for producing next-generation semiconductor devices with ever-shrinking feature sizes and increased complexity. One of the key features of XT 1950Hi is its advanced illumination system, which utilizes multi-pole illumination technology to achieve uniform and high-resolution patterning across the entire wafer surface. This unit allows for the precise control of light intensity and angle, enabling the patterning of intricate patterns with high fidelity. In addition to its advanced illumination machine, XT1950HI is equipped with a high-precision stage tool that enables sub-nanometer positioning accuracy. This stage asset allows for the precise alignment of the wafer to the reticle, ensuring that patterns are transferred accurately from the mask to the wafer surface. To further enhance its performance, ASML XT 1950Hi features a high-speed autofocus model that rapidly adjusts the focus of the projection lens to maintain optimal image quality during exposure. This feature is essential for achieving high resolution and uniformity across the entire wafer, especially when patterning complex structures with varying depths. ASML XT1950HI also comes equipped with an advanced reticle handling equipment that enables the quick and precise exchange of reticles during production runs. This feature is crucial for minimizing downtime and maximizing productivity in high-volume manufacturing environments. In terms of productivity, XT 1950Hi offers a high throughput capability, allowing manufacturers to produce a large number of wafers per hour with exceptional yield and reliability. This high throughput is achieved through a combination of fast exposure times, efficient stage movement, and advanced automation features that streamline the production process. XT1950HI is also designed to be highly flexible, supporting a wide range of reticle sizes and types to accommodate different patterning requirements. This flexibility allows manufacturers to use the system for a diverse set of applications, from logic and memory devices to advanced packaging technologies. Overall, ASML XT 1950Hi represents a significant advancement in wafer stepper technology, offering industry-leading precision, performance, and productivity for the production of advanced semiconductor devices. With its advanced features and capabilities, this unit is well-suited for the most demanding semiconductor manufacturing environments, where extreme accuracy and efficiency are paramount.
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