Used ASML XT 760F #9237243 for sale
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ID: 9237243
Wafer Size: 12"
Vintage: 2006
DUV Scanner, 12"
Locking kit
TAMIS (EMTA):
Z7 Offset: ±4.0 nm (-5.96)
Z8 Offset: ±4.0 nm (-1.11)
Z7 Tilt in X: ±2.0 nm/cm (-0.04)
Z9 Offset: ±4.0 nm (0.48)
SAMOS (EMCA):
SAMOS: ≤3% (1.74)
SLIT Uniformity (LUSU):
- / NA / S.In / S.Out / Control spec / Down spec / Result
Annular (M-Action) / 0.7 / 0.55 / 0.85 / 1.50% / 3.00% / 0.31
Conventional / 0.65 / 0 / 0.75 / 1.50% / 3.00% / 0.26
Conventional / 0.7 / 0 / 0.6 / 1.50% / 3.00% / 0.28
Model result parameter:
Best focus: ±0.015 (0.002)
Image height C1 (um): 0 ±0.015 (0.002)
Image height C2 (um): 0 ±0.015
Image height different (um): 0 ±0.015
Image tilt ry C1 (urad): 0 ±0.5 (-0.279)
Image tilt ry C2 (urad): 0 ±0.5
Image tiltry different (urad): 0 ±0.5
Intrafield:
Focus range chuck 1 Before: <120 nm (91.6)
Focus range chuck 2 Before: <120 nm
Focus range chuck 1 After: <120 nm (89)
Focus range chuck 2 After: <120 nm
Focus range C1 different (nm): 0 +15 (2.6)
Focus range C2 different (nm): 0 +15
Astigmatism range C1 different (nm): 0 ±5 (0.6)
Astigmatism range C2 different (nm): 0 ±5
Result after correction:
IPD Mean (nm): <120 (89)
IPD STDEV (nm): <10
Astigmatism mean (nm): <70 (36)
Astigmatism STDEV (nm): <10
Dose accuracy and repeatability performance (ODAR):
Dose accuracy: <2.0 (max) (1.416)
Dose repeatability: <0.5 (0.057)
CARL ZEISS SMT Lens
Charcoal filter
External interface module
Bottom module
Reticle stage
Covering panels frame parts
Covering panels frame MCAB
Covering panels
RSRC Cabinet
MCWC Cabinet
MDC Cabinet
LCWC Cabinet
Exhaust cabinet
Machine parts clean folder
Side channel blower
(6) Machine parts
Double stage
CYMER Laser not included.
ASML XT 760F is a wafer stepper tool designed for lithography applications used in the production of integrated circuits. It provides high resolution and uniformity, allowing for precise, repeatable imaging when compared to other traditional optical wafer steppers. ASML XT:760F is equipped with a proprietary kinematic motion equipment which is capable of generating extremely accurate and smooth motion for the positioning of the lenses and mirrors. This motion system is designed for maximum accuracy with minimized drift values of lateral stages and is capable of operating at high frequencies in order to achieve a stable and repeatable imaging process. It is also equipped with a two-axis Pololu robotic actuator, which is specifically designed for precision motion in lithographic applications. XT 760 F utilizes a high-performance digital galvanometric scanner for imaging. This scanner is designed to provide a stable imaging process while ensuring high precision moves of the scanner mirror in the X, Y and Z axes. This scanner is also equipped with a beam-shaping module that enables high resolution imaging. The included software modules and hardware features allow for easy and accurate control and alignment of the scanner. XT:760F is equipped with a high-resolution CCD camera that is designed for capturing an image of the wafer after the lithography process has been completed in order to measure the surface features of the ICs. The camera is also equipped with an advanced image-processing algorithm that is designed to reduce noise and enhance image contrast. Furthermore, the camera unit is designed to capture images with low levels of thermal noise providing a stable imaging environment. XT 760F is a highly automated wafer stepper that enables reliable and repeatable imaging. It is capable of imaging with resolutions up to 25nm, with exposure times of just a few seconds. The machine is capable of consistent image uniformity on a wafer as well as reliable repeatability across wafers. Additionally, it is highly efficient, providing simultaneous imaging of multiple wafers. This allows for maximum throughput while still maintaining a high level of accuracy and precision.
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