Used ASML XT 760F #9293671 for sale

ASML XT 760F is a high-performance wafer stepper designed for photolithographic processes. The machine is capable of achieving sub-5 nanometer resolution and can handle a range of substrates, from fused silica, quartz, or sapphire wafers to thin-film silicon, silicon germanium, and perovskite thin films. The machine is equipped with an advanced patterning system designed for patterning down to the smallest feature sizes. The main components of ASML XT:760F are the advanced substrate stage, the stepper controller, the mask alignment module, and the high-speed processing module. The advanced substrate stage is a high-precision, multi-axis moveable stage that allows precise and repeatable positioning of the substrate. The stage is capable of supporting a range of substrates for patterning and has been designed to minimize cross-axis errors. In addition, the stage features onboard calibration routines that can adjust for substrate shape imperfections or misalignments. The stepper controller is responsible for controlling the position of the stage and adjusting for nonlinear motion errors and alignment errors. The controller is also responsible for controlling the exposure of the wafers based on the selected process parameters. Finally, the controller has an autofocus feature to ensure the most accurate focus on the processing surface for a given exposure time. The mask alignment module provides the ability to accurately create alignment marks and perform tilt compensation for non-concentric circles or deformed shapes. The module is designed to minimize misalignments and increase the yield of each product. Finally, the high-speed processing module enables the machine to pattern down to the smallest feature sizes at very high speeds. The module is capable of achieving an exposure time of 0.9 seconds, reducing the wait time between exposures. In summary, XT 760 F is a high-performance wafer stepper designed for photolithographic processes. The machine is capable of achieving sub-5 nanometer resolution and can handle a range of substrates. The advanced substrate stage, stepper controller, mask alignment module, and high-speed processing module make ASML XT 760 F the ideal machine for creating high-quality photolithographic products with minimal wait times between processes.