Used ASML XT 760F #9311379 for sale

ASML XT 760F is a wafer stepper used in photolithography applications. It uses a step-and-repeat imaging technology, which is designed to lithographically transfer patterned layouts onto semiconductor material. Its main components include a stepper, an x-ray source, an aligner, a lithography lens, and an optical focus equipment. The stepper is the heart of the machine, and operates much like a projector. It is equipped with a motorized x-y stage, a highly accurate piezoelectric motor-driven optical subsystem, and an advanced light source. The x-y stage moves the wafer to its desired position quickly and accurately so that it can be exposed to the optimal light intensity and direction. The piezo mechanism provides motion control of the x-y stage and the focusing of the lenses, allowing for precise placement and alignment of the wafer to the lithography pattern. The light source generates UV radiation and is wavelength-stabilized, which ensures that it remains consistent with each exposure. The alignment system ensures that the wafer will be positioned precisely in relation to the pattern on the photomask. The wafer is scanned over an "alignment grid", a set of crosshairs and markers. This allows the machine to detect and calculate any discrepancies between the wafer and the pattern on the mask, and quickly make the necessary adjustments to ensure that the pattern is accurately transferred. The lithography lens is the physical component that the UV light passes through before irradiating the target substrate. It is responsible for providing the desired resolution and accuracy of the lithographic pattern. The lens contains a series of focusing elements that allow it to shape the light however is needed. The lens is also able to tilt and rotate to compensate for any distortions created by the underlying wafer's surface. The optical focus unit is used to ensure that the correct intensity and resolution is maintained throughout the entire lithographic process. It consists of an autofocusing machine, which monitors the focal position of the imaging lens repeatedly to make sure it is always optimized, and an ultra-high power laser, which is used to precisely modify the shape of the lithography pattern. Finally, the wafer handling tool is responsible for loading and unloading the wafer from the stepper's substrate table. It is equipped with robot arms that can grab and securely position the wafer, and a rotating platform where the wafer can be placed. The wafer handling asset is highly precise and efficient, ensuring that the wafer is securely loaded so that the exposure process can begin quickly.