Used ASML XTII / 1400F #9401145 for sale

Manufacturer
ASML
Model
XTII / 1400F
ID: 9401145
Vintage: 2006
Immersion lithography system 2006 vintage.
ASML XTII / 1400F is a wafer stepper, a piece of equipment used in the microelectronics industry for the production of semiconductor devices. It is an advanced lithography tool that uses a beam of ultraviolet light to serially transfer patterns from a reticle onto a photosensitive substrate. XTII / 1400F is a KrF stepper, meaning that it utilizes a wavelength of 248 nm of high-energy, KrF excimer laser light to project a pattern onto a wafer coated with a specific photosensitive substance. This process is referred to as step-and-repeat lithography. The stepper comprises several key components, including an illumination source, projection optics, reticle stage, wafer stage, and scanner. The illumination source of ASML XTII / 1400F is the KrF excimer laser. This laser emits a beam of ultraviolet light through a slit aperture in the reticle mask. The beam passes through an aperture corresponding to the desired pattern on the reticle. The lens system then directs the light onto the target substrate. The reticle stage of XTII / 1400F allows precise positioning of the reticle relative to the wafer for a precise alignment of the optical image. The wafer stage allows for precise motion of the wafer relative to the optical image projected onto it. The scanner, a combination of two focusing mirrors and two galvanometer mirrors, is used to precisely sweep the field of the reticle pattern across the substrate. ASML XTII / 1400F operates at a speed of up to 4 wafers per hour, with a resolution as low as 140nm. It has a wide pattern field size ranging from 10mm to 200mm, making it suitable for producing patterns of various sizes on different substrates. The stepper can accommodate multiple substrates and offers the flexibility to be reprogrammed to accommodate numerous different applications. To ensure precise pattern placement and uniformity on the substrate, XTII / 1400F is equipped with numerous features such as programmable spatial distortion correction, alignment cameras, overlay, stage vibration control, and a sophisticated computer controlled platform. These features make ASML XTII / 1400F an ideal choice for applications in the semiconductor, scientific, and medical industries.
There are no reviews yet