Used ASML XTII / 1400F #9401147 for sale

ASML XTII / 1400F wafer stepper is a highly specialized lithography equipment used in semiconductor manufacturing. It is a state-of-the-art tool used to create highly complex, nanoscale structures on a silicon chip. XTII / 1400F is a step-and-scan system that uses an off-axis imaging technique to create nanometer-scale features on a substrate. It has a numerical aperture (NA) of 0.77 which enables it to print features down to 28nm line widths and 16nm pitches. The machine is equipped with a full-field reticle with a large diameter of 14" and a pattern density of 3.2 megapens/cm2. This allows for high throughput and excellent uniformity from print to print. ASML XTII's system architecture features two independent scan axes which allow for faster exposure time. It has an exposure field size of 8" x 8" with a high frame accuracy of +/- 0.1 um. The machine also includes a remapping algorithm and a pattern recognition system to ensure alignment accuracy and improved throughput. ASML XTII / 1400F is powered by ASML TwinScan technology which provides a highly efficient and repeatable process. This technology allows the machine to adjust exposure parameters such as dose, focus, and alignment in real-time. In addition, TwinScan™ also allows the user to program customizable recipes, as well as optimize wafer throughput and tool productivity. XTII / 1400F wafer stepper comes with an intuitive user interface that provides direct and easy access to essential features and settings. The machine allows for plug-and-play operation, meaning it requires minimal setup for operation. Furthermore, it can be easily configured for usage in both etch and clean processes. Overall, ASML XTII / 1400F wafer stepper provides a robust lithography platform with unmatched image quality and uniformity. This machine is an ideal choice for chip manufacturers looking for high throughput, repeatable performance, and flexible operation.