Used CANNON FPA 1550 MARK IV #9155402 for sale

CANNON FPA 1550 MARK IV Wafer Stepper is a high-precision, digital imaging equipment that is used for patterning wafers in the fabrication of integrated circuits or other devices. It is capable of producing highly accurate line widths and feature sizes, allowing for complete control of each feature on the wafer surface. The system is comprised of a nitrogen-cooled cold field electron microscope (CFEM), a dielectric coating unit, an electron-beam exposure/pattern generator, and an alignment machine. The nitrogen-cooled CFEM provides high-resolution imaging, allowing for precise patterning of the wafer. The dielectric coating tool coats the wafer in a dielectric material, providing a conductive path for the electron beam to travel through. The electron-beam exposure/pattern generator can then be used to draw patterns onto the surface, accurately and reproducibly. Finally, the alignment asset is able to register the patterns drawn onto the respective features of the wafer and ensure that they are properly etched. The Overall performance of FPA 1550 MARK IV Wafer Stepper makes it a great choice for any user looking for a model that provides the best combination of precision and accuracy. It can achieve a maximum resolution of 4nm, allowing for controlled patterning of applications with especially tight feature sizes. Additionally, the equipment's thermal stability and drift-free operation ensures highest levels of repeatability over time, resulting in consistently reliable operation. CANNON FPA 1550 MARK IV also offers easy operation and superior user experience. Its intuitive user interface and display enables easy navigation and programming for end-users. It is also highly compatible with a wide range of exposure sources and materials, allowing for a range of applications and materials to be processed. Finally, the heavy-duty construction ensures reliable use in any environment. In short, FPA 1550 MARK IV Wafer Stepper is a powerful system capable of providing high-resolution imaging with excellent thermal stability and repeatability. Uniquely designed to ensure the highest levels of accuracy and repeatability over time, it also offers easy operation and superior user experience. This makes it an ideal unit for anyone looking for an advanced wafer processing solution.