Used CANON 13 #9284912 for sale

CANON 13 is a precision wafer stepper manufactured by CANON Inc. It is designed for high-accuracy photolithography in the Semiconductor, Photonics, MEMS, and IC/MEMS/BIO industries. The machine is designed for high-throughput applications, and is capable of producing extremely high-quality images on substrates such as silicon, quartz, and glass. 13 features a dual-head design, with a main optical unit and a separate shutter control unit. The main optical unit contains a frequency-doubled KrF Excimer Laser for high throughput on thin wafers. It also contains two adjustable focus lenses, one for the light source and the other for the projection lens, enabling precise control of the light intensity, spot size, and focus. The projection lens is a, three-grouped aspheric lens that is designed for high performance lithography on wafers. The main optical unit also contains an exposure stage, which has a motor drive and support mechanisms for the wafer. The shutter control unit provides the shutter speed for the laser, allowing precise control of the exposure time. It contains shutter arm mechanisms and a time based shutter control for accurate exposure control. The exposure time can be adjusted from 0.2ms to 5ms. CANON 13 also contains a X-Y autostage, which enables wafer scanning across the entire exposure area. It can scan up to 2000mm/sec on any direction. The X-Y autostage is driven by a highly accurate feedback motor. It also contains a X-Y synchronous control data output circuit, allowing for accurate synchronization between the shutter control unit and the autostage. 13 also features a highly accurate alignment and focus control equipment, which ensures that the resulting image is precise and accurate. It features a high-precision automatic alignment system, which is capable of accurately aligning the laser with the photomask. The focus control unit is designed to ensure that the projection lens is focused accurately on the wafer. CANON 13 is an advanced, high-precision lithography machine that is designed for maximum accuracy and throughput. Its features and controls enable it to produce extremely accurate and high-quality images. Its ability to quickly scan large areas, while providing precise control over the exposure time and accuracy, makes it the perfect choice for those who need high-quality and reliable lithography solutions.