Used CANON 1550 Mark II #167582 for sale

CANON 1550 Mark II
Manufacturer
CANON
Model
1550 Mark II
ID: 167582
G-line stepper with spare parts available.
CANON 1550 Mark II is a state-of-the-art wafer stepper, developed for precise wafer exposures, offering high accuracy and excellent performance. This advanced wafer stepper is equipped with a compact design, allowing it to carry out precise and efficient wafer exposures with minimal waste. 1550 Mark II has a 5-axis stage equipment, capable of achieving precise stage positioning and precise alignment of an applied pattern mask on the wafer. It is equipped with an LED-Lens system, allowing highly precise exposure, with an optical resolution of less than 5nm. An auto-leveling unit ensures stable wafer positioning, waiving off the requirement of any adjustments before exposure. Additionally, the stepper is also equipped with a high-frame-rate scanner, which enables a maximum exposure speed of 8 seconds per wafer. CANON 1550 Mark II can handle wafers of various sizes, ranging from 1 inch to 8 inch. Its stage machine also allows easy switching from one size to another, eliminating the need for any recalibration. Its air displacement tool offers a clean, safe environment for wafer handling. This wafer stepper is also equipped with a unique two-mirror exposure asset, which helps the beam of light to be evenly applied on the target surface. This model also eliminates the need for any reflectors, which helps to save time and maximize precision. 1550 Mark II is designed to be easy to adjust and maintain, being equipped with a well-thought out U-shaped adjustment equipment. Its attention control program assists the user in fine-tuning the Wafer stepper parameters, providing efficient and effective one-step adjustment. In summary, CANON 1550 Mark II is an advanced wafer stepper that offers precise exposures, with a high degree of accuracy and stability. It is designed to be easy to use and maintain, ensuring maximum efficiency and minimal waste. It is ideal for various applications and is an excellent choice for accurate wafer exposures.
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