Used CANON 52 #9284911 for sale

CANON 52 is a wafer stepper manufactured by CANON Inc., used in the semiconductor industry for lithography purposes. This machine has the capability to project an image onto the wafer at a magnification ranging from 5X to 75X, using an exposure operation which combines the imaging principles of a high-resolution optical equipment and an advanced semiconductor pattern generator. The system is designed with a variety of integrated features to ensure high precision in the result of the lithography process. It has a Position Measurement Unit (PMS) which integrates information about the motor, position of the stages, direction of movement, and alignment conditions, in order to achieve greater accuracy in the exposure operation. The machine also includes a Contortion Compensation Tool (CCS) which exploits the design of the hydro-static stage to reduce vibration, enabling higher resolution imaging. 52 also has an exposure facility which can handle a range of numerical apertures (NAs) and wavelengths, in order to maximize light utilization. The asset also incorporates a Sensor Enhanced Technology (SET) which enables active auto-alignment management, controlling the exposure conditions based on wafer characteristics. This ensures accurate image exposure throughout the production. The model is equipped with an auto-focusing equipment for high-precision and fast focusing to match a variety of wafer heights. This auto-focusing system is an Opto-Mechatronic Design providing real-time turbulence compensation. The unit also has an Interferometer Wavefront Sensor which is used to measure and detect any changes in the wavefront optical distortion between the wafer and the optics, allowing for accurate exposure operation. CANON 52 is capable of handling a wide range of wafer sizes, ranging from 1-inch up to 8-inch and the machine has a capacity of 1,000 wafers per hour. The exposure mode supports step and repeat and scan exposure, with a fully automated fault detection and correction tool, designed to prevent any exposure errors. In addition to these features, 52 also offers a high level of process understanding through advanced pattern optimization and analysis. This enables manufacturers to optimize wafers and adjust exposure parameters without having to perform multiple exposure runs. This process optimization capability improves efficiency, reduces waste, and boosts yield rates.