Used CANON ES2 #9272652 for sale

CANON ES2 is a wafer stepper, known for its superior accuracy, high throughput and excellent image quality at low doses of radiation (X-ray). It is one of the most advanced solutions available to the semiconductor industry, often used for the creation of microstructure imaging. CANON ES 2 was designed to offer fast, precise scans and motorized operation, with a throughput of up to 1 Wa/sec as its standard setting. Even at this speed, the accuracy of the scan is kept high, with the potential to achieve stages of accuracy up to 0.2 µm. As a wafer stepper, it features a dual-stage stepping mechanism, comprising of an XY scanning stage and a vertical mounting stage. The XY stage features a piezoelectric direct-drive system, eliminating the need for bulky, traditional stepping motors, for improved accuracy, speed and repeatability. ES2 is equipped with a highly efficient optical system, which allows the user to take advantage of a partial-scan mode and reduce exposure time while maintaining image quality - with a range of possible resolutions for accurate imaging. It is also capable of micro-exposure, a feature that allows it to create imaging on very small areas, as small as 5 µm, with high accuracy. The wafer stepper also offer the user a number of software optimisation features to enhance the accuracy, reliability and reproducibility of the imaging. Its auto exposure control allows for single-shot image acquisition with consistently accurate results, while its multi-exposure compensation software allows the user to overlap exposures creating high quality images. In addition, its drift correction feature helps to compensate for earth's gravity and vibration in order to ensure higher resolution imaging with fewer errors. Overall, ES 2 is an advanced wafer stepper designed to ensure highly accurate imaging with minimal exposure time. Its powerful dual stage XY stepping mechanism, efficient optical system and range of software features make it an ideal choice for any specialised semiconductor imaging requirements.