Used CANON EX4 #9247920 for sale

CANON EX4
Manufacturer
CANON
Model
EX4
ID: 9247920
Wafer Size: 8"
Excimer stepper, 8".
CANON EX4 is a state-of-the-art wafer stepper, designed as the next-generation stepper solution in precision lithography and materials analysis. EX4 is a full-field scanning stepper that is capable of exposure field sizes ranging from 25mm to 300mm. The stepper features augmented precision alignment utilizing telecentric optical elements and expanded focus automation, ensuring superior productivity and repeatability. These features, combined with CANON CSPI (Common Stepper Precision Initiative) allows for a maximum overlay accuracy of 0.05µm (20nm). CANON EX4 has a maximum resolution of 0.4µm and can perform up to 3 exposures per die in a single shot at up to 8μm for low magnification or 10µm for high-resolution magnification. The stepper also features a double board placement equipment, which permits both manual and automated operation, allowing users to adjust and display the board pattern in both map and image formats for enhanced efficiency and accuracy. EX4 has an impressive optical system that offers a depth-of-focus of up to 12µm, allowing for a faster, more accurate exposure field. In addition, the stepper's force refresh unit is designed to detect any errors in exposure and correctively adjust the z-axis over the entire field quickly. The machine also eliminates stray light interference, ensuring accurate imaging. CANON EX4 is easy to maintain and has superior safety measures for personnel and products. Fully integrated with CANON Layout Manager software package, users can also access over 10,000 part-configurable recipes and libraries for optimal exposure control and repeatability, as well as an on-board robot handler for easy board handling. Ultimately, EX4 is the ideal wafer stepper for fabs and universities that need superior accuracy and smooth operation. With the latest wafer scanning solutions and trouble-free operation, CANON EX4 is the perfect tool for controlled, precision lithography and materials analysis.
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