Used CANON FPA 121 #9177558 for sale

CANON FPA 121 is a wafer stepper used in the photolithography process for semiconductor manufacturing. It is an advanced, high-performance step-and-repeat exposure equipment with an 8-inch (200mm) wafer size. FPA 121 has a high numerical aperture (0.75) for greater resolution and improved etching. A dynamic scan system (DSS) enables rapid, highly precise pattern transfer by scanning the stage with moving mirrors. This technology also ensures accurate placement and alignment on the wafer regardless of its properties or the number of patterns. CANON FPA 121 has an increased throughput of 1.4 Wspm (wafers per hour) with a single wavelength illumination unit, and a consistent performance, even at high throughputs. It also provides advanced technologies such as auto exposure control, point-to-point stitching, and fast scan over the entire wafer surface. FPA 121 has an arched mask chuck that reduces distortion of the mask substrate and an advanced mask aligner with a wide measurement range of 175µm. It also has low contamination with an ion implanter option and a six-axis angular table. The advanced stepper has an improved resolution of 32nm, allowing patterns to be etched accurately and rapidly. It also has a high performance automatic inspection (API) machine that improves defect location accuracy and inspection speeds. CANON FPA 121 has a fast approach unit that can move quickly between two points in both X,Y, and Z axes, allowing high-precision mask layout. Several modules can be combined together to form a single step-and-repeat tool, making it suitable for various production line applications. In summary, FPA 121 is a high-performance step-and-repeat exposure asset that provides unique features like a high numerical aperture, dynamic scan model, increased throughput, advanced technologies, low contamination, improved resolution, and fast approach unit. It is suitable for various semiconductor manufacturing lines and is designed to provide precise, rapid pattern etching.