Used CANON FPA 1550 M IV-W #9296891 for sale

Manufacturer
CANON
Model
FPA 1550 M IV-W
ID: 9296891
Steppers.
CANON FPA 1550 M IV-W Wafer Stepper is a high-end lithography tool designed to produce complex micro-scale structures in a repeatable, reliable manner. At its core is a 6-inch photolithography platform that combines a programmable illumination system, micrometer-level stages, and high-throughput optics. This enables the reliable pattern transfer of the smallest optical elements, at an accuracy unmatched in the industry. CANON FPA 1550 MIV-W Wafer Stepper employs high-throughput optical elements for accurate imaging of small features down to 60 nm. The illumination system features interchangeable light sources, and the versatile wavelength range of 434 nm to 590 nm is adjustable to match the property of the resist. The advanced aberrations correction ensures uniform illumination of the wafer surface with minimized wavefront errors, providing superior image resolution and fidelity during exposure. The positioning stages of FPA-1550 MIV-W Wafer Stepper are designed to provide a wide range of motion motions, with a larger-than-usual working space. With a minimum step size of 0.05 μm, and a minimum step time of 30 msec, CANON FPA-1550 MIV-W can achieve a high-precision alignment of patterns with extreme accuracy. The wafer stage features both X-Y and orthogonal rotations (θ) to provide seamless control over the wafer during exposure. The scanner optics of FPA 1550 MIV-W provides from 4x to 60x magnifications, and the numerical aperture range of 0.25-0.7 affords near-field imaging capabilities for topological features. Additionally, the optics are designed to reproduce photosensitive materials with high contrast, definition and fidelity. FPA 1550 M IV-W Wafer Stepper is a complete lithography tool, and is able to seamlessly switch between single and double exposure modes. The tool also features auto-dose control and auto-focus algorithms, providing unparalleled repeatability and throughput. Additionally, the machine is designed to be easily integrated into a process environment, allowing for automated full-wafer inspection and validation. CANON FPA 1550 M IV-W Wafer Stepper is a unique and powerful tool that is specially designed for the needs of today's CMOS fabs. With its high throughput, accuracy, and precision, the machine is well-suited to the demands of modern semiconductor lithography processes, making it a perfect choice for demanding manufacturing scenarios.
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