Used CANON FPA 1550 MARK IV-W #293589762 for sale
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ID: 293589762
Wafer Size: 6"
Vintage: 1995
i-Line stepper, 6"
HP1000 PC
Jeida standard wafer
Wafer type: OF
Reticle, 5":
QUARTZ Material type
Changer type: CANON Changer type-2
Case type: CANON Changer type-1
Optical system:
UL21-LS Lenz type
Magnification: 1/5
Field size: 22 mm
Illumination system:
Light source: Ultra-high pressure mercury lamp, 2.0 kW
Light control: Estimate exposure total
Masking function: (4) Independent blades
Wafer loader:
Type-1 / Type-2
Alignment light / HeNe Laser / HeCD Laser
Wafer alignment:
Type-1 / Type-2
System / HeNe Laser image processing / HeCD Laser sensor
Mode / AGA
Reticle alignment:
Type-1 / Type-2
Alignment light / g-Line
System / g-Line, TV image processing
XY Stage:
Type-2: Rolling around type
Automatic focus:
Type-2: LED PSD OPTF, 5-Channels
Wafer leveling:
Type-2: 3 Points drive global / Die by die leveling system
Mechanical pre alignment:
Type-2: Peripheral noncontact system
TV Pre alignment:
Type-1 / Type-2
System / OFF-Axis TV Image system
Carrier / (2) Loaders/(2) Unloaders
Chamber:
Type: TBW-CD-30W
Cooling system: Refrigeration unit／Heater control
Set temperature:
Booth：21℃
Stage／Lenz: 23°C
Reticle feeder: (14) Store reticles
CCD Camera
Inline: Stand alone
Signal tower
HeNe Laser missing
1995 vintage.
CANON FPA 1550 MARK IV-W is a state-of-the-art wafer stepper that utilizes advanced imaging technology to precisely fabricate precision structures and components down to the micron level. This integrated equipment offers a range of sophisticated features, such as high NA step-and-scan lithography, sub micron alignment accuracy, incremental stage movement, an expanded resolution range, and an expanded minimum feature size. It is also designed with a modular architecture and can be expanded to suit specific needs. CANON FPA 1550 MARK IVW offers high NA step-and-scan lithography for the fabrication of custom layouts for complex structures and components. This feature enables the rapid production of accurate and repeatable images with a maximum acceleration of 7Gs. The system's high NA and continuous scan operation provides ultra-fine resolution down to the sub-micron level and an expanded resolution range from 6.5 to 25 nm. FPA-1550 MARK IV-W has an alignment accuracy of 1 micron which is integrated into CANON Micromage advanced alignment-unit. This is powered by a highly efficient using a combination of segmented illumination and collimated area detection. This allows for a wide range of substrate materials including silicon, glass, and quartz to be accurately aligned and processed. The complete machine has a modular architecture, allowing it to be equipped with up to 10 stepper stages, each with a maximum resolution of 256 nm. The components feature an on-board memory that stores positional information and feature data to ensure accurate placement of components. This feature reduces potential error and expedites production. CANON FPA-1550 MARK IV-W can accommodate various substrates with minimal distortion and an expanded minimum feature size of 0.2 micron. It is equipped with CANON MicroMirror vibration isolation and CASA (Constant Acceleration Stress Absorber) filter that effectively reduce the risk of vibration and image distortion. Overall, FPA 1550 MARK IV-W is a state-of-the-art stepper that is capable of producing precise structures and components with a sub-micron resolution and accuracy. It also features an advanced alignment tool, modular architecture, and vibration isolation to ensure optimal results in a minimal time span.
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