Used CANON FPA 1550 MARK IV-W #9033673 for sale

CANON FPA 1550 MARK IV-W, a wafer stepper, is a fully automated lithography equipment that is designed to produce high precision features on fragile substrates. This machine is capable of reaching feature sizes as small as 25 nm line width, allowing for the production of semiconductor integrated circuits, MEMS devices, and other similar products. CANON FPA 1550 MARK IVW employs advanced optical systems and a unique dual source system to produce both regular and reverse image, allowing for improved exposure integrity. Utilizing electrostatic and magnetic fields, it is capable of controlling the position and orientation of the substrate in a highly accurate manner. This is further combined with a high intensity exposure light source and a range of lenses with a wide numerical aperture. This unit also includes an automated alignment machine that utilizes a two-step process. It utilizes a coarse alignment scanning tool to quickly determine the proper alignment and also includes a fine alignment scanning asset that is used to finely adjust the alignment of the wafers and the substrate. This allows for the precise registration of images on the substrate. FPA-1550 MARK IV-W is also equipped with an advanced stage heating and cooling model that ensures precise regulation of the substrate temperature. This ensures optimal performance of photoresists even under large temperature changes. Overall, FPA 1550 MARK IV-W is a highly advanced lithography equipment that is capable of producing high precision features on fragile substrates with feature sizes of 25 nm or smaller. By utilizing a dual source system, automated alignment scanning, and a stage heating and cooling unit, this machine allows for consistently high quality results.