Used CANON FPA 2000 i1 #293591390 for sale

CANON FPA 2000 i1 is a wafer stepper designed to provide precise lithographic imaging with high throughput and excellent accuracy. It features two lasers, an interfaced periodic alignment equipment, and advanced illuminator/detector technology. A sophisticated Defocus Monitor System (DMS) also helps ensure stable exposures. The device is powered by dual-source optical pickup head technology, with an advanced illuminator-detector combination capable of providing high resolution imaging. The DMS helps to provide uniform repeat exposure dose and pattern placement for both single layer and multiple layer resist exposures. It provides real-time feedback to the optics unit for defocus and stage distortion correction. Full 5-axis motion is maintained using CANON high precision motion control machine. CANON FPA2000-I1 offers a high resolution imaging of 20 nanometers, which is necessary for many current microfabrication processes. The tool is designed with two lasers, used in combination to maximize exposure accuracy. It also features a sophisticated Defocus Monitor Asset (DMS) which is able to adapt itself to the current application, scanning each field and automatically compensating for any deviations in pattern placement caused by stage aberration. The model has a built-in intelligent illuminator, capable of handling the most challenging resist exposure requirements with reliable repeatability. This software's capabilities include scan line optimization, mask optimization, field indexing, and pattern segmentation. FPA-2000I1 is also automated, offering a comprehensive set of operating modes like automated calibration, self-diagnostics and fault handling, and on-board Z depth optimization for performing high-precision focusing and exposure control techniques. Overall, CANON FPA 2000 I 1 is an advanced wafer stepper, which can provide precision lithography imaging with excellent accuracy and reliability. Featuring two lasers, an interfaced periodic alignment equipment and a sophisticated DMS, the system is capable of offering a high resolution imaging of 20 nm and automated, customizable operation modes. With a built-in illuminator and various impressive features, this unit is an ideal choice for taking your microfabrication process to the next level.