Used CANON FPA 2000 i1 #9033674 for sale

CANON FPA 2000 i1 is a wafer stepper that was released in 2005 and is designed for high precision applications. It is a step-and-scan lithography exposure equipment that has capabilities of high productivity and image uniformity. It is used in the advanced semiconductor photolithography process. It has applied electro-optics technology to the successful FPA-2000 platform, resulting in two production models, CANON FPA2000-I1 and the FPA-2000 i3. FPA-2000I1 model has an illumination system of Reduced Out-of-Field Astigmatism (ROA) and an alignment unit of Symmetric Alignment Machine (SAS), while the FPA-2000 i3 model includes Synchronous Double Pattern Generator (SDPG) is installed. CANON FPA-2000 I1 wafer stepper is composed of five main components: an illumination tool, a projection optics asset, an alignment model, a reticle works equipment, and a wafer stage system. The illumination unit, which consists of a laser, a light trap, and a combination of refractive and/or reflective optical components, is used to generate light and direct it onto the reticle. The projection optics machine, which includes an aspheric lens and other components, is used to project the image from the reticle onto the wafer. The alignment tool is composed of linear displacement sensors that can detect the X, Y, and Theta positions of a reticle. The reticle works asset consists of a reticle changer, a reticle library, and a heat exchanger. The wafer stage model, which consists of a scanner and an X-Y stage, is used to move the wafer in the X, Y, and Z directions. FPA-2000 I 1 has a field size of 4 inch (100mm) and a shot size of up to 4 inches (25.6mm). It achieves high accuracy in the shot-to-shot overlay (<3µm shot-to-shot) and 30nm line widths. The stepper also has the capability of repeatable exposure capability for wafer runs of up to 3 million shots without manual intervention. Overall, CANON FPA-2000 I 1 wafer stepper is a reliable, high-precision lithography exposure equipment designed for semiconductor processing. It offers efficient throughput, high accuracy, and repeatable process reliability. It is an ideal system for advanced semiconductor processes.