Used CANON FPA 2000 i1 #9247809 for sale

CANON FPA 2000 i1 is a wafer stepper designed with the advanced features and technologies that are necessary to efficiently produce high-performance integrated circuit components. The equipment enables users to accurately achieve sub-micron-level feature sizes and accurate overlay potential of +/- 0.5 microns. CANON FPA2000-I1 uses a stepper mechanism with a two-bounce asymmetric cross-vector alignment system that is capable of producing two-micron features. This unit is designed for maximum flexibility and performance, allowing the device to adjust settings automatically based on the process need. The machine includes a powerful suite of image processing tools and advanced imaging technologies. FPA-2000I1 incorporates a high-resolution monochrome camera and a thermal evaporator test stage in order to accurately determine overlay alignment performance. A wide variety of additional components including a High-Speed Interference Analysis Tool (HISA) are also available to further enhance process performance. The wafer stepper also features a low-power mode that reduces energy consumption during operation and provides a robust platform to minimize service calls. The asset is designed with built-in maintenance functions that enable users to easily diagnose and repair any faulty components. For processes requiring extraordinary precision, CANON FPA-2000I1 is equipped with an advanced image intensifier model. This equipment allows users to accurately attain feature sizes measured in fractions of nanometers. By incorporating a direct-write technology, the system is able to accurately reproduce patterns at resolutions that are normally associated with electron beam lithography. FPA2000-I1 is based on CANON Flexible Architecture, which allows users to easily customize the unit to the specific needs of their production processes. Built-in countermeasures, such as a high-performance image stabilizing machine, ensure that users can reliably produce high-accuracy components with extensive repeatability and that optical exposure can be accurately adjusted. FPA 2000 I 1 is a useful tool for users that require superior levels of optical performance for devices with complex patterning requirements. The tool features robust performance and is capable of producing advanced features that are required for high-performance integrated circuits.