Used CANON FPA 2000 i1 #9298396 for sale

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Manufacturer
CANON
Model
FPA 2000 i1
ID: 9298396
Wafer Size: 6"
Vintage: 1992
Stepper, 6" Power: 15.3 kkVA Reticle size: 5", CANON STD Wafer feeder: Type-L PA Unit: 6", O.F Type Chamber: TBW-CD50 W Console version: V5.13B Illuminator: FPA-2000 i line A Scope: i-line, TTL T/Z-Tilt Unit: Piezo Stack,3 (L,M,R) Support mount: Servo passive damper 4 Lamp house: 1.5 kW Electrical: 3Ø, AC 200 V, 50/60 Hz 1992 vintage.
CANON FPA 2000 i1 is a wafer stepper with a field application of 1:1, a numerical aperture of 0.50, and a working distance of 2.6mm. The product is designed to accurately process various kinds of semiconductor wafers. It is versatile and can process a wide range of semiconductor field applications from 150nm to 6.5 microns. CANON FPA2000-I1 offers a high level of accuracy and resolution for processing all kinds of semiconductor wafers. The device is dual mode and allows for both single and multiple wafer processing. It is designed with a 30 Hz process rate for single wafer and up to 800 wafers per hour when processing multiple wafers. FPA-2000I1 utilizes laser alignment to ensure accuracy of the pattern and reticle placement. FPA2000-I1 has an atmosphere control system that maintains a temperature of 19 ± 4°C and a relative humidity of 45 ~ 65%. It is equipped with a DC magnification of 1.0 to 12.5 x, and an XY resolution of 0.3 nm which makes it ideal for any application where accuracy and precision are essential. FPA-2000 I1 also features EPI/ion implant capability, air-bearing beam scanning, low total harmonic distortion of 1% at 400 x magnification, off-axis illumination that controls stray light, and UV optical fiber manipulation. The wafer stepper is equipped with four-step alignment which ensures a high degree of accuracy when processing wafers. Additionally, the machine is designed for use in cleanroom environments and is capable of chemical wet etching. It has a built-in auto-wedge maker to reduce the time it takes to prepare a wafer for processing. CANON FPA-2000 I 1 has an LED bar display for warning notifications and a user-friendly IC programmer. In conclusion, FPA 2000 I 1 is an optical wafer stepper designed to process a wide range of semiconductor wafer applications. It offers a high level of accuracy and resolution, dual-mode operation, laser alignment, EPI/ion implant capability, and other features. Additionally, its atmosphere control system, four-step alignment, LED bar display, and user-friendly IC programmer make the device ideal for cleanroom environments.
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