Used CANON FPA 2000 i1 #9313447 for sale

CANON FPA 2000 i1 is a wafer stepper used in the semiconductor industry for fine patterning and fabrication of integrated circuits. It is a 4-beam projection stepper with a maximum exposure area of 20mmx10mm. CANON FPA2000-I1 has built-in multiple-wavelength illumination equipment which utilizes ArF (193nm) and KrF (248nm) excimer lasers, as well as a UV laser. This allows the wafer stepper to optimize the exposure time and achieve a high resolution of less than 1 micron for fine imaging. The exposure head also features a 6-axis stage with a maximum speed of 10mm/sec and precision of 0.1mm, ensuring accurate alignment and positioning of the wafer for optimal patterning. FPA-2000I1 is designed with a modular 1-frame optical system, which allows for simple integration onto other systems such as metrology or inspection tools. It also offers a high resolution, high dynamic range, and very low distortion. The unit utilizes a variable numerical aperture (NA) objective lens with a maximum NA of 0.4 and adjustable Z-focus, together with a digital alignment module. This combination of features allows for exposure corrections and enables high-accuracy imaging. CANON FPA-2000 I 1 has a built-in motorized microscope that can be used to evaluate the patterns at the wafer level, as well as measure line widths or critical dimensions of the patterns. The stepper can also be equipped with a reinforced safety machine that is designed to protect the personnel from laser radiation. FPA-2000 I 1 has an easy-to-operate interface and support for both manual and recipe-based operations which can be programmed using a drag & drop interface. The tool also offers real-time data monitoring, recording, and analysis. Overall, FPA2000-I1 is a powerful and accurate wafer stepper with versatile features and a compact design. It provides excellent process control and enables fine patterning and production of high-precision integrated circuits.