Used CANON FPA 2000 i1 #9396114 for sale

CANON FPA 2000 i1 is a wafer stepper that utilizes an i-line, the most cost-efficient workhorse of CANON family. The FPA 2000 has both high resolution and accuracy allowing for precise processing times. The model i1 includes an advanced scanner equipment and CANON proprietary optics for improved edge-definition. With laser alignment and backlighting, its levels of stability remain very low, allowing for the highest level of success. It also incorporates CANON patented ScanShift System, which helps to improve feature registration in step and repeat applications. These features allow the FPA 2000 to produce a wide variety of device types, including high-density interconnected systems, high-voltage CMOS, non-volatile memory, and MEMS devices. Its objective lens and apertures are configured to image the smallest features with a minimum linewidth of 0.18 microns with its alignment accuracy of <5 nm. CANON FPA2000-I1 also features an improved vacuum unit that helps to reduce particle contamination and further increase resolution. Other notable features include the patented VLE Exposure Machine, a fully integrated non-contact metrology-overview tool, high-level on-board process control, as well as an automated alignment asset. The VLE model not only offers a great level of accuracy and repeatability, but also has been shown to virtually eliminate across-the-board variation in lithography that may occur in different substrates. The FPA 2000 includes an interface-module with a touch-screen interface that allows users to easily customize their exposure recipes. Its advanced control screen allows users to access all the information relevant to their process and to control a variety of parameters, including; focus-position, field flattening, exposure energy, and position of the optical elements. In addition, the interface module also allows users to bind multiple recipes together for rapid processing. The precision of FPA-2000I1 makes it an excellent choice for advanced production needs. It is an ideal solution for a range of applications, such as the manufacture of high-density and MEMS devices. With its stable fields, it is capable of addressing the most challenging products and it is also highly reliable.