Used CANON FPA 2500 i2 #293604238 for sale

CANON FPA 2500 i2 is a state-of-the-art, high-performance projection stepper suited for all nanofabrication and semiconductor processes. It is specifically designed to produce extremely precise photomasks that meet the highest quality requirements. CANON FPA-2500I2 is built with a high-precision, patented Vacuum Chucking Mechanism which supports up to a 200mm silicon wafer. This mechanism provides a virtually static environment which ensures the highest level of accuracy and repeatability. The unit is equipped with an integrated Coaxial Structured Light Reflective Illumination Equipment which allows efficient light uniformity across the whole field of view. TheCANON FPA-2500 I2 has a variable numerical aperture optics with a resolution of 2.5nm, making it an ideal choice for semiconductor wafer fabrication. It is also equipped with a low distortion spherical objective lens that makes it possible to achieve a fast stepper focus speed. In addition, this stepper features an advanced fast-scan lithography system which reduces processing times and yields a higher level of throughput. It also has advanced anti-vibration technologies, such as a large damping base, to help eliminate any vibration during operation. Finally, FPA-2500I2 is built with a highly responsive control unit which allows for simple and efficient operation. This control machine has been designed with a user-friendly interface to make it easy to use. it also provides detailed information about all settings, such as layer thickness and exposure settings, to ensure a consistent, top-quality output. Overall, FPA-2500 I 2 is an outstanding stepper for nanofabrication and semiconductor processes. It ensures high-precision accuracy, repeatability and throughput that meets the highest requirements. Its advanced design, fast scan lithography tool, low distortion optics and user friendly interface makes it an ideal choice for any semiconductor application.