Used CANON FPA 2500 i2 #293608642 for sale

CANON FPA 2500 i2 is a high-precision wafer stepper designed specifically for semiconductor device fabrication. The advanced design of the stepper offers advanced features such as 2 μm & 2.5 μm alignment accuracy and 10 nm overlay accuracy for efficient, high-performing operation. CANON FPA-2500I2 is controlled using an embedded closed-loop controller that utilizes two optical interferometers to monitor each of the two axes, thereby providing high-precision and stability. The machine also offers a 100 μm back focal length and an aperture of 0.9 mm to ensure that light is delivered with excellent uniformity to ensure precise device fabrication. The machine utilizes a precision multilayer lithography equipment to ensure fine control over exposure parameters such as exposure time, flash intensity and angle of exposure. An ultra-precise image exposure system helps to ensure highly accurate and controlled device fabrication processes. The stepper has a fully automatic exposure unit that utilizes the latest pattern-recognition technology for accurate and effective exposure controls. The machine also features a process-monitoring machine that offers fast, precise and repeatable multi-layer registration. FPA-2500 I2 offers excellent flexibility and scalability options. A wide array of retractable exposure packages allow for a smooth transition from single-layer to multilayer exposure, allowing for constant and precise exposure processing. CANON FPA 2500 I 2 is a highly-precise stepper that meets the high standards of modern semiconductor device fabrication. The advanced features of the machine allow for precise and accurate fabrication of highly precise devices. The machine's flexible design makes it an ideal choice for any semiconductor development facility.