Used CANON FPA 2500 i2 #293608643 for sale

CANON FPA 2500 i2 is a wafer stepper designed for production environments. It utilizes a two-dimensional alignment method in order to accurately create a high yield of precise patterns on the wafer's surface. This state-of-the-art machine has a maximum resolution of 0.3um and a field size of 9.6mm x 9.6mm. The primary application of CANON FPA-2500I2 is in fine patterning tasks as well as doing lithography work on a variety of materials, including metal,GaAs, and SOI. FPA-2500 I2 is equipped with a proprietary CANON projection optics equipment, including an Edmund Optics Flexible Magnification System. This unit provides high-resolution imaging capabilities and allows for fast, repeatable alignment and exposure. The projection optics machine operates at 250mm Fluorite lenses and a LaB6 cathode power source. FPA 2500 i2 features a high-resolution imaging tool for mask alignment. The asset utilizes four CCD video cameras to determine the precise location of the mask pattern on the wafer surface. The alignment model can be quickly calibrated and adjusted to accurately align the mask pattern with the wafer. Additionally, the imaging equipment boasts a fast window capture time of 0.24 seconds and has improved 8M pixel resolution. For increased reliability, FPA 2500 I 2 has a film weight sensor system which automatically adjusts to correct for differing film weights. It also has an automated cleaning unit which reduces cycle time and or prevent dust contamination of the optics. CANON FPA-2500 I2 is a powerful and efficient wafer stepper. Its Edmund Optics Flexible Magnification Machine can increase yields, while its film weight sensor tool, automated cleaning asset, and advanced alignment model ensure precise and repeatable patterning results. This wafer stepper is a highly reliable and productive tool for advanced lithography and fine patterning applications.