Used CANON FPA 2500 i2 #9033675 for sale

CANON FPA 2500 i2 Wafer Stepper is a next-generation lithography equipment designed for high-precision semiconductor manufacturing. The system is equipped with a high-precision actuator with a large controllable range, a projection unit with advanced optical elements, and a superior illumination machine. CANON FPA-2500I2 is designed for advanced lithography processes, from sub-micron to several hundred microns wide, with a repeatable accuracy of down to 0.5 nm. The tool uses a double-pressure air bearing actuator, which utilizes air pressure to move the wafer in sub-micron steps precisely. Due to its large controllable range, it can be used to process a wide variety of patterns that are up to several hundred microns wide with very seeking repeatability. The asset has a projection model composed of unique advanced optical systems which increases the precision of the lithography offerings. Additionally, it of incorporates a superior illumination equipment that utilizes an annular slit with an advanced phase shift and lit mask structure, which can improve the depth of field and image resolution. In addition, FPA-2500 I2 Wafer Stepper includes a number of safety features. It uses an automated in-scan optical force monitor system which prevents surface damage or destruction of silicon layers during exposure steps, detecting any variation in pressure before imaging starts. The wafer stepper is equipped with a precision observation unit that can control the temperature of the machine and monitor defects in real time. Overall, FPA-2500 I 2 is a superior wafer stepper designed for precision lithography applications such as semiconductor manufacturing. It utilizes a double-pressure actuator and superior optical elements to guarantee detailed, repeatable accuracy on the nanometer level. In addition, its safety features assure operators are able to enjoy an easy and reliable operation with quality results.