Used CANON FPA 2500 i2 #9238502 for sale

CANON FPA 2500 i2 is a fully automated high-throughput stepper for photolithography processing of semiconductor wafers. The equipment consists of an advanced all-reflection optical system with a large working distance and a high numerical aperture (NA). This enables the unit to process wafers with a diameter of up to 200mm and with external shape tolerance of up to 3µm. The wafers are mounted on the machine using a vacuum-contact stage with 6-axis sensor and a tension meter to ensure a stable, repeatable image across the entire surface of the wafer. The tool features an advanced alignment stage using a combination of low-speed and high-speed pattern matching techniques, that is coupled with multiple exposure techniques allowing for the repeatable imaging of high-resolution patterns. The asset is also equipped with a wide array of exposure modes, such as normal and fast exposure, exposed field stitching and array scanning, which allows for the imaging of even complex structures with accuracy and high throughput. The model incorporates an advanced image calibration equipment to ensure that images produced across multiple wafers remain consistent. In addition, the system also has a thermal management unit which is designed to reduce the negative effects of temperature shifts on exposure accuracy. CANON FPA-2500I2 also includes a powerful micro-controller which allows for customizable operator settings, a fully automated wafer loading and unloading machine, and advanced exposure monitoring systems which ensure reliable, repeatable performance of the tool. The asset is capable of producing extremely accurate photolithography images with a high degree of precision, at exposure doses down to 0.2J/cm², across a 200mm (8") wafer size. The 3000i2 is thus ideal for photolithography applications where high-speed and precision imaging of high-density patterns is essential.