Used CANON FPA 2500 i2 #9298394 for sale

CANON FPA 2500 i2 Wafer Stepper is a precision lithography tool designed for processing a multitude of ultra-fine lines, patterns, and features through photolithographic imaging. The equipment utilizes a 5 megawatt ArF Excimer laser and is designed to meet the rigorous demands of ultra-high precision circuit and device fabrication. It is capable of printing a wide range of microelectronics devices, including SOC varieties and medical components, onto a variety of substrates. The system is comprised of several precision components, such as a 5-megawatt ArF excimer laser, an XY stage for precision placement, an optical precision lens, and a 6-axis robotic structure. The ArF excimer laser is output at a wavelength of 193 nm and has a pulse duration of 10 ns. The laser beam is then directed onto the substrate via the optical lens. Once the beam is incident on the substrate, the XY stage is used to accurately position the overall pattern required by the application. The 6-axis robotic structure of CANON FPA-2500I2 is designed for optimal utilization of the laser's capabilities. The robot features a multi-axis stepper drive, which allows for sub-micron positioning with a maximum scan speed of 100,000mm/s. This enables high-precision feature placement in a large-area scattered field pattern. It also offers multiple parallel scan options, allowing for simultaneous scanning in several directions. FPA-2500 I2 Wafer Stepper provides an excellent option for nanofabrication needs. Its combination of precision, speed, and flexibility make it an ideal solution for the production of microelectronics and medical components. The unit also offers a variety of post-processing functionalities, such as a beam-analysis meter and an integrated micro-flatter. Furthermore, the machine is outfitted with a CCD camera and a Grid Laser Alignment Tool, both of which allow for efficient registration of large-area patterns.