Used CANON FPA 2500 i2 #9298398 for sale

Manufacturer
CANON
Model
FPA 2500 i2
ID: 9298398
Wafer Size: 6"
Vintage: 1994
Stepper, 6" Power: 18.7 kVA Reticle size: 6", Canon STD Wafer feeder: Type-L PA Unit: 6", O.F Type Chamber: TBW-CD60 Illuminator: FPA-2500 i line A Scope: i-line, TTL T/Z-Tilt Unit: 3 (L,M,R) Support mount: Servo passive damper Lamp house: 1.5 kW Electrical: 3Ø, AC 200 V, 50/60 Hz 1994 vintage.
CANON FPA 2500 i2 is an advanced, semi-automated, optical, wafer stepper used in research and development laboratories, as well as in industrial settings. This equipment is equipped with several impressive features, optimized for efficiency and accuracy. For instance, the integrated Reflective Super High NA (Ref-SHNA) optics design is intended to produce a higher numerical aperture as compared to traditional lithography systems. This allows for smaller feature sizes to be produced, giving a higher resolution and greater accuracy. Additionally, this design helps to minimize diffraction, scattering, and noise, enhancing overall performance. The machine is equipped with a laser scriber, which has a system of vibration suppression that is used to reduce vibration errors during scribing operations. This reduces defocus and contamination while improving the accuracy of lines. The laser scriber also features an advanced design that includes three dimensions of cutting and scintillation, providing greater control and accuracy. CANON FPA-2500I2 is capable of imaging over a large area of up to 200 mm in diameter, The machine is further capable of imaging in different directions, such as forward, reverse, and rotation for accurate alignments. The unit is equipped with an automatic wafer handling machine, enabling high-speed processes with accuracy and precision. Furthermore, this tool offers a simplified user interface with a touch screen display for easy operation, as well as customized recipes for fine-tuning to specific patterns. Additionally, accommodation for both Positive (PR) or Negative (NR) resists is provided, as well as the ability to implement a variety of liquids. FPA-2500 I2 provides an extremely versatile lithography asset for a range of research, development, and production applications. With its advanced features and impressive capabilities, this model is the perfect tool for creating high-precision patterns with a high yield rate.
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